Handbook of Chemical Vapor Deposition: Principles, Technology and Applications

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William Andrew, 2.12.2012 - 458 sivua
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations.

Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors.

This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
 

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CHAPTER 1 INTRODUCTION AND GENERAL CONSIDERATIONS
1
CHAPTER 2 FUNDAMENTALS OF CHEMICAL VAPOR DEPOSITION
17
CHAPTER 3 THE CHEMISTRY OF CVD
51
CHAPTER 4 CVD PROCESSES AND EQUIPMENT
81
CHAPTER 5 THE CVD OF METALS
126
CHAPTER 6 THE CVD OF NONMETALLIC ELEMENTS AND SEMICONDUCTORS
163
CHAPTER 7 THE CVD OF CERAMIC MATERIALS
198
CHAPTER 8 CVD IN ELECTRONIC APPLICATIONS
272
CHAPTER 9 CVD IN OPTOELECTRONICS AND OTHER ELECTRONICALLY RELATED APPLICATIONS
302
CHAPTER 10 CVD IN OPTICAL APPLICATIONS
322
CHAPTER 11 CVD IN WEAR EROSION AND CORROSIONRESISTANT APPLICATIONS
347
CHAPTER 12 CVD IN FIBER POWDER AND MONOLITHIC APPLICATIONS
386
ALTERNATIVE PROCESSES FOR THINFILM DEPOSITION AND SURFACE MODIFICATION
408
INDEX
414
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Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

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